High‐Mobility and Reliability Ultra‐Thin‐Channel Oxide Semiconductor Field‐Effect Transistors for Chip‐Interconnect‐Embedded Logic and Ferroelectric Memory

ABSTRACT Logic and memory transistors integrated with oxide semiconductors are promising for monolithic 3D systems that enable reconfigurable functionality and enhanced on‐chip communication. However, challenges in controlling carrier mobility, carrier concentration, and defect density have hindered their deployment in advanced chip technologies. Here, we report a heterojunction oxide semiconductor channel approach that mitigates the interface/channel defect density and achieves field‐effect mobility to >100 cm 2 /V.s, competitive with thin‐film silicon channels. By engineering a bilayer oxide channel, we demonstrate a low‐thermal‐budget, ultra‐scaled, memory‐logic dual‐mode ferroelectric transistor that exhibits a high on‐state current of 800 µA/µm at V d = 1 V, a positive threshold voltage, and excellent reliability with only 30 mV threshold shift after 5000s of gate‐bias stress. Furthermore, it exhibits robust memory endurance exceeding 10 7 cycles and a fast ferroelectric read‐after‐write delay of 180 ns. TCAD simulation (Ginestra) reveals that performance improvement is attributed to the defect self‐compensation effect in bilayer channel, which stabilizes disordered metal bonds and weakly bonded oxygen states. This work establishes a pathway towards reliable, high‐performance oxide‐based transistors, offering a scalable solution for next‐generation low‐power reconfigurable chips tailored for generative artificial intelligence.