Development and Optimization of Fine-Pitch RDL for RDL Interposer and Embedded Bridge Die Interposer Fabrication Using Fan-Out Wafer-Level Packaging Technology

Fine-pitch redistribution layers (RDLs) are key enabling technologies for fan-out wafer-level packaging (FOWLP)-based interposers used in chiplet and high-bandwidth memory (HBM) integration. In this study, a CAR-based photolithography process optimized for fine-pitch RDL fabrication was evaluated to realize 2 μm/2 μm line/space (L/S) RDL structures in an FOWLP environment. Key lithographic parameters, including exposure energy, focus offset, and thermal processing conditions, were systematically optimized to establish a stable and reproducible process window. Cross-sectional analysis confirmed the structural integrity of the electroplated RDL features formed under the optimized conditions. To assess functional feasibility, channel-level electrical simulations were performed using JEDEC-defined HBM3 signal assignments. Simulated eye diagrams indicate that the fabricated fine-pitch RDL interconnects are capable of supporting HBM3-class signal transmission with a moderate level of signal integrity. The presence of jitter and noise suggests that further optimization of RDL transmission line impedance is required. Rather than presenting a fully optimized interposer solution, this work provides an engineering-level assessment of lithographic and process constraints associated with implementing 2 μm class RDLs in FOWLP-based interposers, offering practical insight into fine-pitch RDL process window definition for advanced packaging applications. This work uniquely combines systematic CAR-based lithography optimization with cross-sectional structural validation and HBM3-class channel-level simulations to define a practical process window for 2 μm/2 μm RDLs in an FOWLP environment.