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◆ APL Electronic Devices2026-05-26· Materials science

High breakdown field multi-kV UWBG AlGaN transistors

Seungheon Shin, Kyle Liddy, Jonathan Pratt, Can Cao, Yinxuan Zhu, Brianna Klein, Andrew Armstrong, Andrew A. Allerman, Siddharth Rajan

原始摘要(英文原文)· Original abstract
We demonstrate high-performance UWBG AlGaN PolFETs exhibiting a state-of-the-art combination of nearly 1 A/mm on-state current (∼960 mA/mm) and a large breakdown field (>4.8 MV/cm) in high carrier density (1.15 × 1013 cm−2). Multi-kV robustness is successfully demonstrated, exhibiting 1.28 and 2.17 kV by utilizing a gate-connected field plate structure in 3.9 and 6.8 μm LGD, corresponding to the extremely low specific on-resistance of 1.25 and 2.86 mΩ cm2, respectively. High RF performance is also achieved, providing fT and fMAX of 8.5 and 15 GHz, respectively, for 3.9 μm LGD. These results highlight UWBG AlGaN as a platform for both high-voltage RF and power applications.
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