Xuyang Song, Tao Long, Jun Zhao, Chunxiang Ni, Xinqing Li, Manwen Liu, Kun Wang, Jiahao Fu, Taiping Lu, Zheng Li
To address the limitations of traditional trench electrode silicon detectors, such as charge collection dead zones and non-uniform electric fields, this paper proposes a novel 3D silicon detector based on an interleaved trench electrode structure. By constructing interleaved N-type and P-type heavily doped trenches on a lightly doped N-type substrate, enhanced uniformity and depth profile optimization of the electric field distribution are achieved. Moreover, 3D numerical simulations based on TCAD demonstrate that the proposed structure provides a uniform, planar-like electric field distribution; reduces low-field regions; and enables fast carrier collection with a low full-depletion voltage. The results provide a theoretical basis and design reference for the development of novel 3D radiation detectors with low depletion voltages, fast charge collection, and favorable radiation response characteristics.