Adaptive phase aberration correction in off-axis digital holographic microscopy using distance-field-weighted Zernike fitting

This paper proposes a numerical method based on distance-field weighting and Zernike fitting for aberration correction in digital holographic microscopy (DHM) systems. The core method involves generating an adaptive weighting scheme from a distance field to guide Zernike polynomial fitting. This approach preserves the intrinsic sample phase in object regions, ensures smooth background transition, and achieves precise aberration correction while mitigating bias from sample phase contamination. Experiments conducted on a USAF 1951 resolution target, plastic microspheres, and live yeast cells demonstrate that, compared to direct Zernike polynomial fitting, the proposed method achieves more accurate phase reconstruction of the measured objects with reduced errors.