Pengfei Zhu, Chi Zhang, Jingbo Yang, You-Wei Guo, Shida Huo, Enxiu Wu, Fei Wang, Che-Yi Lin, Jyun-Hong Chen, Hongling Chu, Zhaorui Liu, Song Zhao, Jun Li, Mengjiao Li, Yen-Fu Lin, Jianhua Zhang
Although reconfigurable van der Waals devices featuring flexible logic transformation offer a promising strategy toward adaptable architectures to accommodate diverse computational demands, reliable polarity control and scalable integration remain challenging. Here, we demonstrate a reconfigurable field-effect transistor based on the scalable dielectric oxide-van der Waals quasi-floating-gate configuration, enabling nonvolatile polarity switching and multi-state programmability. Charge trapping engineering in an atomic-layer Al2O3/HfO2/Al2O3 dielectric stack achieves performance with nonvolatile conductance update (>6-bits for 1000 s), robust endurance (>3 × 105 cycles), and well-balanced electron/hole transport (current mismatch ratio ~ 1%). TCAD simulation and surface potential analysis reveal oxygen vacancies-dominated polarity switching dynamics. Using a silicon-compatible top-gate dielectric process and complementary design, diverse logic gates-including eight Boolean operations and seamless AND-OR-Invert/OR-AND-Invert transformations-are accommodated into compact reconfigurable logic-in-memory circuits. These transistors also simplify ternary content-addressable memory design, underscoring their potential for efficient logic-in-memory computing.