Oleksii Bezkrovnyi, Piotr Kraszkiewicz, Michael Vorochta
The effect of the partial pressure of hydrogen on the reduction processes in CeO2 nanoparticles was investigated. The surface reducibility of CeO2 upon exposition to 0.01–5 mbar and 5–402 mbar of H2 was investigated by NAP-XPS and H2-TPR techniques, respectively. Special attention was focused on studying the role of partial pressure of H2 (ranging from 5 to 402 mbar in the input gas mixture) on the H2-TPR profile. The effect of H2 partial pressure on the course of surface and bulk reduction of CeO2 was shown and discussed.