Caden Chittick, Shaghayegh Abtahi, Nayanathara Hendeniya, Sohini Mondal, Andrew White, Boyce Chang
Supramolecular poly(4-vinylpyridine) complexes were developed as a tunable platform for soft plasma etching. Etch rate can be significantly enhanced while maintaining homogeneous etching between the polymer and complexing molecule. This method is extended to self-assembled block copolymers where pattern transfer was achieved by increasing the etch contrast in the supramolecular domain.