◆ Journal of Materials Chemistry C2026-01-01· Materials science
Recent advances in design and preparation of abrasives for chemical mechanical polishing of hard-brittle materials
Qing Ma, Xinhuan Niu, Jiakai Zhou, Ziliang Liu, Mengqi Wang, Shaobo Song, Zheng Wu, Bin Hu, Jin Li, Jiao Hong
原始摘要（英文原文）· Original abstract
This review summarizes CMP abrasive design, properties, removal mechanisms, optimization, applications, challenges, and future directions for balancing removal rate and surface quality in ultra-precise processing of hard-brittle materials.