Synthesis and structural characterization of MAX phase thin films by radio frequency sputtering and annealing

The family of MAX phase compounds has emerged as promising engineering materials with potential applications in various fields, including supercapacitors. Radio frequency sputtering, a low-temperature thin-film deposition process, allows for the precise deposition of Ti-Al-C multilayers. This study investigates the key steps in the formation of Ti 3 AlC 2 thin films on a copper substrate by converting Ti-Al-C multilayers as a function of annealing conditions. X-ray diffraction, scanning electron microscopy analysis, UV-visible spectroscopy, and FTIR spectroscopy provide structural insights. These findings provide significant insights into the development of binder-free and environmentally friendly anodes with copper current collectors. The versatility and performance of our approach make it a promising candidate for the growing demand in the supercapacitor and battery industries.