Govind Padmakumar, Aravind Balaji, Matthias Criel, Federica Saitta, Gianluca Limodio, Paula Perez‐Rodriguez, R.A.C.M.M. van Swaaij, Arno H. M. Smets
High Resolution Image Download MS PowerPoint Slide Textured glass is used in a wide range of applications to improve optoelectrical performances, such as photovoltaics, biosensing, microfluidics, and photonics. Honeycomb textures have demonstrated an excellent performance in optical devices using crystalline silicon wafers as opaque substrates. As a pathway to translate these advantages to configurations implementing glass, hexagonal-shaped microsized craters (honeycombs) are made on glass in this study. We use photolithography combined with wet etching for this process. The relationship between photoresist mask design, glass–photoresist adhesion, wet-etching steps, and the mechanism of honeycomb formation is studied. It is demonstrated that the higher the isotropic nature of etching achieved, the deeper the hexagonal craters will be. The potential of hexagonal textures on glass to significantly reduce reflection to <8% over the entire spectral range is observed. Finally, hexagonal microsized textures with 5 μm periodicity and 1.01 μm depth that effectively diffuse 50% of the total transmitted light at near-infrared (1100 nm) wavelengths are developed.