Stefano Pasini, A. Baraldi, Ildikó Cora, Gianluca Foti, Muhammad Kashif, Francesco Mezzadri, Ifeanyi John Onuorah, A. Parisini, B. Pécz, Samaneh Shapouri, Giovanna Sozzi, Donato Spoltore, Alessio Bosio
We report the development of a novel water-assisted growth ZnO (HZO) transparent conductive oxide (TCO) deposited by reactive d.c. magnetron sputtering in Ar/O 2 /H 2 O atmosphere. Controlled water dosing acts as a surface surfactant, promoting c-axis oriented columnar grains with enhanced crystallinity and superior carrier transport properties. The HZO films exhibit high optical transparency across the visible spectrum (E g = 3.28 eV) and low resistivity arising from degenerate conduction mechanisms. Electron mobility exceeds 30 cm 2 V -1 s -1 and the carrier concentration is on the order of 10 19 cm -3 , consistent with a Burstein-Moss blue-shift partially compensated by band-gap renormalization. Density Functional Theory (DFT) supports these findings, elucidating the electronic origin of the Fermi level shift and the interplay between band filling and defect. When integrated as a front contact in Sb 2 Se 3 -based solar cell, HZO matches or surpasses conventional ITO or aluminum doped ZnO contacts, improving short circuit current (J sc ) and reducing series resistance due to enhanced light scattering and charge transport. In short, rather than inserting an additional buffer layer, a single HZO layer can directly serve as the TCO, thereby eliminating the free-carrier absorption often seen in ITO as well as the In/Al contamination issues commonly associated with ITO- and AZO-based stacks. The combination of environmentally friendly elements, scalable low-cost manufacturing, and exceptional optoelectronic properties make HZO a promising next-generation TCO solution for sustainable energy technologies.