Jianliang Liu, Jinghua Ye, Wei Xiao, Hao Zhu
ABSTRACT Microwave plasma cleaning has emerged as a high‐efficiency, low‐damage, and environmentally compatible alternative to conventional wet chemical cleaning in precision manufacturing. This review examines the principles of microwave plasma generation and the ionization behavior of common working gases, including nitrogen, oxygen, argon, and hydrogen to clarify the mechanisms of contaminant removal. Reactor components such as waveguides, impedance tuners, and quartz discharge tubes are discussed for their roles in plasma stability and energy transfer. Compared with direct current and radio frequency plasma systems, microwave plasmas provide higher electron density and ionization efficiency, enabling rapid surface activation and decomposition of organic residues while reducing solvent use, wastewater generation, and pollutant emissions.